DOYOU KNOW MEGASONIC CLEANING ?
SCHWARTMAN
In 1985, for the first time, megasonic cleaningtechnology was successfully used to clean nano-scale particles, whichmade this technology rapidly popular in nano-scale cleaningindustries such as semiconductor silicon wafer cleaning and lasergyroscope cleaning. Today, megasonic cleaning technology has beenwidely used in the cleaning field of optical instruments and medicaldevices.
WHAT IS MEGASONICE CLEANING TECHNOLOGY?
Megasonic cleaning is a nano-scale cleaningtechnology, which is delicate and safe. It has been cited in thefield of special precision cleaning. During cleaning, the transduceremits high-energy sound waves with a wavelength of megahertz, and themolecules of the cleaning solution are driven by the megasonic waves.Under the acceleration movement, the maximum instantaneous speed canreach 30CM/S, and high-speed fluid is generated to clean the mirrorsurface, so that the protein particles attached to the lens surfaceare quickly peeled off and enter the cleaning solution.
On the other hand, megasonic waves can go deepinto the lens mesh to remove protein particles smaller than 0.1LLXM,which can play a role that ultrasonic waves can't reach, and at thesame time play the role of two methods of surface cleaning andinternal care.
In addition, the frequency of megasonic cleaningis high, and cavitation bubbles like ultrasonic cleaning will not beformed, and the surface of the lens will not be damaged.